A comparative study of defect states in light-soaked and high-temperature-annealed a-Si:H

Authors: 
Z. M. Saleh, H. Tarui, S. Tsuda, S. Nakano and Y. Kuwano
Conference: 
Proc. of the Materials Research Society
Proceeding Volume: 
1993
Location: 
San Francisco, USA
Date: 
Thursday, April 1, 1993
Abstract: 
Our previous results of light-induced electron spin resonance (LESR) indicate that, in hydrogenated amorphous silicon (a-Si:H), light-induced defects differ from those formed during deposition or high-temperature annealing. A plausible interpretation, in which light-induced defects occupy higher-energy states, was proposed to explain these differences. In this study, the constant photocurrent method (CPM), dark conductivity and steady-state (SS) LESR are used to supply new evidence for the difference and conduct two important tests on our hypothesis. In striking agreement with our predictions, we find that the light-induced changes in the SS-LESR lineshape (a decrease in the narrow component relative to the broad one upon light exposure) become indeed more dramatic as the demarcation energies move closer to the midgap by increasing temperature or decreasing bias-light intensity for SS-LESR.