fbpx A comparative study on ICP high-density plasma, plasma-enhanced and low pressure CVD silicon nitride films |ARAB AMERICAN UNIVERSITY
Contact information for Technical Support and Student Assistance ... Click here

A comparative study on ICP high-density plasma, plasma-enhanced and low pressure CVD silicon nitride films

Authors: 
J. Yota
J. Hande
A.A. Saleh
Journal Name: 
J. Vac. Sci Technol
Volume: 
1
Issue: 
1
Pages From: 
1
To: 
1
Date: 
Saturday, January 1, 2000
Copyright © Arab American University 2000-2024. All rights Reserved.